http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11323563-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 1998-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7524eff1aea412440744825f9189e6a5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e6f75060248cf32e853500b6a4aa825 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3bcad47de31daf3063e0f806c065dddd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c954d4181fc3e9415e0866dbb503634 |
| publicationDate | 1999-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11323563-A |
| titleOfInvention | Apparatus and method for forming deposited film by plasma CVD |
| abstract | [PROBLEMS] To form a deposited film by a plasma CVD method suitable for forming a light receiving member using a non-crystalline deposited film such as an amorphous or polycrystalline film on a support. apparatus. A plurality of source gas introduction pipes are formed by two or more different source gas introduction systems. Each of the tubes 103 has a plurality of gas emission holes 104 in at least two directions, and the blowing direction 105 of the holes 104 is A reaction having a vacuum-hermetic reaction space constituted by at least an upper wall, a peripheral wall also serving as a cathode electrode, and a bottom wall, which is set in a specific range in which deposition film formation conditions are made uniform and a discharge is not disturbed. A container, a means for holding the deposited film forming support in the reaction space, a plurality of tubes 103 provided around the support, a high-frequency energy introducing means for exciting the introduced source gas to generate a glow discharge, And an exhaust port and an exhaust unit for evacuating the inside of the reaction vessel to a vacuum. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013163841-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8123902-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016117934-A |
| priorityDate | 1998-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.