http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1131651-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1997-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac5e126cfab8ed6f192a51f42f1e2bae |
| publicationDate | 1999-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1131651-A |
| titleOfInvention | Electron beam lithography system |
| abstract | (57) [Problem] To provide an electron beam writing apparatus capable of writing an oblique drawing pattern of a pattern represented by an oblique line pattern with high dimensional accuracy and in a practical time. SOLUTION: In an electron beam drawing apparatus for forming a spot beam by converging an electron beam from an electron gun to draw a pattern on a material to be drawn, a process of extracting a contour portion of an oblique drawing pattern, A process 4 for changing the pattern arrangement position of the pattern outline is provided to draw an oblique drawing pattern. In the pattern outline, By providing a mechanism to change the conditions for irradiating the spot beam, Draw an oblique drawing pattern. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009147254-A |
| priorityDate | 1997-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419499693 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3033151 |
Total number of triples: 15.