http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11306978-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-227
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
filingDate 1998-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4df86aacf914a8ac378d80e6d93cda11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_938eb11bcb27798296a411b0496f1cba
publicationDate 1999-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H11306978-A
titleOfInvention Method of forming black matrix pattern
abstract PROBLEM TO BE SOLVED: To shorten the development processing time of a photo-cured pattern by using a photosensitive composition having a high adhesiveness to a glass substrate, and furthermore, the photo-cured pattern and the light absorbing property thereon Provided is a method for forming a black matrix pattern which improves the efficiency of a material film (black film) stripping process. SOLUTION: (1) a step of applying a water-soluble photosensitive composition containing a vinylpyrrolidone-vinylimidazole copolymer and a photosensitive component on a substrate and drying to form a photoresist layer, and (2) selecting the photoresist layer (3) removing a non-exposed portion of the photoresist layer with an aqueous alkaline solution to form a photo-cured pattern; (4) a step of applying a light-absorbing substance over the entire surface of the substrate on which the light-curing pattern is formed and drying to form a light-absorbing substance film; (5) a light-curing pattern on the substrate and light absorption on the pattern The black matrix pattern is formed by the step of peeling off the conductive material film.
priorityDate 1998-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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