abstract |
PROBLEM TO BE SOLVED: To provide an excellent pattern profile shape, particularly excellent smoothness of a pattern side wall shape, high dry etching resistance, high sensitivity and high resolution, and no generation of standing waves. To provide an excellent chemically amplified positive photoresist composition. SOLUTION: (a) a resin having a group having a specific structure, which is decomposed by the action of an acid to increase the solubility in an alkali developer, and (b) a compound which generates an acid by irradiation with actinic rays or radiation. A positive photoresist composition containing the same. |