| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3d3fffc3def97a7d560c620f7474d7af |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1998-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee9f7afb0edd18a8d40ff9e653478d6a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5be336d62a4a3a1985594e78f78e15c1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3bd5d7478eacd5fca3a40b85dd15a4a9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21a78a8e9d81e58c480fbbb0fbf0a3d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad4137a47a8ffff7803c8b0d6d663d70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8eccf64b17f435b30f5dcbae411b00c |
| publicationDate |
1999-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H11305434-A |
| titleOfInvention |
Water-soluble electron beam resist |
| abstract |
(57) [Problem] To provide a new resist by performing a new material design that satisfies the conditions required for these electron beam resists for ultrafine processing. A water-soluble electron beam resist having a structure represented by the following general formula. Embedded image |
| priorityDate |
1998-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |