http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11305426-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 |
| filingDate | 1998-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c5d3656f89ecaca6b56c048b46c5000 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58b9546f05539f96093c4b6bd982bb4f |
| publicationDate | 1999-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11305426-A |
| titleOfInvention | Radiation-sensitive composition and method for producing photomask using the same |
| abstract | (57) [Problem] To provide a method for manufacturing a high-resolution photomask with high throughput by solving the problem that the shape of a chemically amplified resist pattern is deteriorated on chromium oxide. Kind Code: A1 (a) a medium having a reaction for changing solubility in an aqueous alkali solution by a reaction catalyzed by an alkali-soluble resin and (b) an acid; and (c) a compound having two or more phenolic hydroxyl groups and camphor sulfone. A radiation-sensitive composition containing at least an acid precursor composed of an ester with an acid is applied on a photomask substrate, irradiated with an electron beam, baked, and developed with an aqueous alkaline solution. |
| priorityDate | 1998-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 60.