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filingDate 1999-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d39214cb075e283032059412a0067f9
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publicationDate 1999-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H11305030-A
titleOfInvention Red filter-film formation method
abstract (57) [Problem] To provide a method for forming a red filter film capable of reducing the problem of environmental pollution and simplifying the process. SOLUTION: A negative photoresist containing a compound represented by the following chemical formula 1 is applied to a panel on which a black matrix pattern is formed to form a photoresist layer, and then, a predetermined region is exposed; Coating and drying the red pigment composition on the photoresist layer, and then developing the red pigment composition. Embedded image However, in the chemical formula 1, l: m: n is 1.0-4. 5: 70.0-98.0: 1.0-20.0.
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Total number of triples: 31.