| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bc905cbef116a1ec61d12125af9427f3 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1998-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97c81b8204693b7e599da0ae34c543b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_903ad98dd1198f0828c48a84ae2f4c49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fcaaf611014078f20b9129bc2073225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2c6f2334de54ac8272fd49ca736c37a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89f009c7a6bf1137979ba9be75c4f296 |
| publicationDate |
1999-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H11295876-A |
| titleOfInvention |
Multi-layer photomask and manufacturing method thereof |
| abstract |
(57) [Problem] To provide a simple multi-layer photomask manufacturing method that replaces the conventional metal sputtering method, and to reduce the manufacturing cost. A light-transmitting substrate, a mask layer provided on the light-transmitting substrate and having a pattern, and arbitrarily provided on an area of the light-transmitting substrate that is not covered by the mask layer. And a plurality of exposed areas containing the ultraviolet light absorbing composition, wherein the exposed areas have an ultraviolet light transmittance of 0 to 10 A multi-level photomask in which there is one or more types of areas that are between 0% and constitutes a multi-level pattern of the photomask. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0045222-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009276774-A |
| priorityDate |
1998-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |