| abstract |
(57) [Problem] To provide a photoresist which has resistance to KrF or ArF laser, can be developed with a TMAH aqueous solution, and has excellent adhesiveness. SOLUTION: A polymer obtained by polymerizing a monomer, which is a novel bicycloalkene derivative represented by the following formula (I), and a photoresist containing the polymer. Embedded image In the above formula, R ′ and R ″ each represent hydrogen or carbon atom 1 Is up to 4 substituted or unsubstituted linear or side chain alkyls, m is a number from 1 to 8, and n is a number from 1 to 6. |