http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11267570-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-26
filingDate 1999-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1adf895541894f75c711dc0e8da6c0a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c7cc3395da3fa7ab07b7043d852cf9a
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publicationDate 1999-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H11267570-A
titleOfInvention Coating device and coating method
abstract PROBLEM TO BE SOLVED: To provide a coating apparatus and a coating method capable of producing a thin-layer coated product having a uniform coating film thickness and having no unevenness at high speed and stably. In the present invention, a slit (4) is formed between a front edge (2) located on the upstream side with respect to the support moving direction (V) and a front edge (2) located on the downstream side, and the front end of the slit (4) is formed at the front end. The extrusion-type coating head 10 having at least one back edge 3 located at a position opposite to the tangent at the slit exit portion of the edge 2 in the direction opposite to the support is applied to the coating surface of the support 1 by the extrusion-type coating head. The coating liquid A is applied in a state where the liquid 6 mainly containing an organic solvent is applied to the surface in advance and sealed. The clearance accuracy of the slit 4 for discharging the coating liquid A in the width direction of the support is set within 5% of the average value of the clearance, and the edge surfaces 5 and 7 of the front edge 2 and the back edge 3 in the width direction of the support. Is set to 30 μm or less.
priorityDate 1999-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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