http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11264798-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-50 |
| filingDate | 1998-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2e430c6f749b0a3f460f1d544adc332 |
| publicationDate | 1999-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11264798-A |
| titleOfInvention | Glass substrate for electronic device and photomask blank and photomask using the same |
| abstract | (57) [Problem] To provide a photomask blank and a photomask using the same as a glass substrate for an electronic device which enables high-precision patterning and projection exposure. A photomask blank, which is one of glass substrates for electronic devices, includes a glass substrate 1 and a chromium film 2 having a light shielding function. The glass substrate 1 is made of a quartz glass material whose main surface and side surfaces are precisely polished. Due to the defect inspection of the optical glass substrate, there is no defect in the substrate 1 depending on the traveling direction of the inspection light. There are no striae inside and the scratches on the surface of the substrate 1 It was confirmed that the width (length in the short axis direction) was smaller than 1 μm. A photomask was prepared from this photomask blank, and the chromium film pattern 2 ' The desired pattern was formed without any cracks or the like due to etching. Further, the pattern was transferred to the transferred object using this photomask, and the pattern transfer was also good. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006088041-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7898650-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8107063-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013200456-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006099041-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007523371-A |
| priorityDate | 1997-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.