http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11258804-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1998-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d2e7bd7d775c3e6365dd10d40840a1 |
| publicationDate | 1999-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11258804-A |
| titleOfInvention | Positive photosensitive composition |
| abstract | (57) [Problem] A positive photosensitive composition having high sensitivity to deep ultraviolet light, especially ArF excimer laser light, It has excellent resolution and resist profile, has sufficient dry etching resistance, can form a resist pattern that does not cause cracking or peeling off from the substrate, and has a standard developer (2.38% TMAH). Aqueous solution) SOLUTION: Positive photosensitive composition containing a compound capable of generating an acid upon irradiation with actinic rays or radiation and a resin having a divalent polycyclic alicyclic unit having a specific structure in a polymer main chain. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014092792-A |
| priorityDate | 1998-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 268.