| abstract |
(57) [Problem] To provide good sensitivity and resolution even when using an exposure light source of 220 nm or less, have sufficient dry etching resistance, and have sufficient stability during storage with time. To provide a negative resist composition. A negative resist containing a compound capable of generating an acid upon irradiation with actinic rays or radiation, a polycycloolefin resin having a hydroxyl group and a carboxyl group and having an alicyclic group in the main chain, and a cyclic imide compound Composition. |