http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11250796-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24C1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J17-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333 |
| filingDate | 1998-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d937ac5c11b89974d45afef3bf3df7c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_291e4d9e2eb0830f5ececd14d3ac8ae1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e49137bd903cbc5b1a56d6650d49a286 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd7b70b7b79d5b9852f30421f33e1e87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d784695368287472b9a3125aa2aa1e9 |
| publicationDate | 1999-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11250796-A |
| titleOfInvention | Substrate provided with relief pattern, method of manufacturing the substrate, method of manufacturing barrier rib of plasma display panel |
| abstract | (57) [Summary] (With correction) [Problem] To obtain high-definition, high-quality barrier ribs free of defects on the entire panel and to manufacture them with high productivity. SOLUTION: A substrate provided with a relief pattern in which a carbon component is not detected from the surface by analyzing the surface of the substrate in a space between the relief patterns by XMA (X-ray Micro Analysis), and a photosensitive resin composition on the substrate A method of manufacturing a substrate provided with a relief pattern by providing a relief pattern by a photolithographic method using an object, or embedding a barrier rib forming material in a gap between the relief pattern and the relief pattern, and then removing and firing the relief pattern on the substrate. In a method of manufacturing a barrier rib of a plasma display panel, a barrier rib is formed on a relief pattern between development patterns or before embedding a material for forming a barrier rib. Wash with a high-speed jet fluid of 00 cm / sec. |
| priorityDate | 1998-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.