http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1124256-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 1997-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c35caa566cc9fa811ad0fde038dbf50e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_961516b24aac50a4fd1ebe365fcdf2e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ef0cacd9d4c8c83934baf8653b0a6ee |
| publicationDate | 1999-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1124256-A |
| titleOfInvention | Photosensitive composition, photosensitive material, method for producing relief pattern and method for producing polyimide pattern |
| abstract | PROBLEM TO BE SOLVED: To provide a photosensitive composition, a photosensitive material, a method for producing a relief pattern, and a polyimide, which exhibit excellent photosensitive characteristics and storage stability, and have high resolution and good process stability. Provided is a method for manufacturing a pattern. SOLUTION: A secondary aromatic amine represented by the following general formula (I) At a normal pressure and a titanocene compound represented by the formula: Photosensitive composition containing addition polymerizable compound having the above boiling point, secondary aromatic amine, titanocene compound represented by the following general formula (I), polyamic acid, dimerizable or polymerizable by actinic radiation Material containing a compound having a stable carbon-carbon double bond and an amino group or a quaternized salt thereof, the photosensitive composition or a coating film of the photosensitive material is irradiated with actinic rays in a pattern. Then, the unirradiated portion is removed by development. (Wherein, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 and R 10 each independently represent a hydrogen atom, a halogen atom, an alkoxy group having 1 to 20 carbon atoms or a heterocyclic ring) |
| priorityDate | 1997-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 190.