http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11223714-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80
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filingDate 1998-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31128112328d697e0b00e4128836356d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9aa83801424d51d77a68bdc14862eedb
publicationDate 1999-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H11223714-A
titleOfInvention Phase mask for manufacturing diffraction grating and method for manufacturing the same
abstract Abstract: PROBLEM TO BE SOLVED: To provide a phase mask for producing a diffraction grating in which the zero-order light component transmitted without being diffracted is made as small as possible so that noise is not generated in the reflection spectrum of the transferred optical waveguide diffraction grating and the phase mask. Manufacturing method of such a phase mask. SOLUTION: A repetitive pattern of a lattice-like concave groove and a convex stripe is provided on one surface of a transparent substrate 2, and the phase mask 1 forms a diffraction grating by interference fringes of diffracted light by the repetitive pattern. A phase mask for producing a diffraction grating, wherein a cross-sectional shape of a repetitive pattern of convex stripes is formed in a substantially sinusoidal shape.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008276259-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008116976-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4556143-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114325941-A
priorityDate 1998-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 30.