| abstract |
(57) [Problem] To provide a radiation-sensitive resin composition having excellent storage stability, high transparency to radiation, and excellent dry etching resistance, sensitivity, resolution, pattern shape, etc. as a chemically amplified resist. provide. SOLUTION: The radiation-sensitive resin composition is (A) an alkali-insoluble or alkali-insoluble resin having a group represented by the following general formula (1) as an acid-dissociable group, (B) a resin which becomes alkali-soluble when itself and / or the group R 4 in the acid-dissociable group is dissociated; Contains a radiation-sensitive acid generator. Embedded image [In the general formula (1), R 1 , R 2 and R 3 each independently represent a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, or R 1 and R 2 And 2 represent a 3- to 6-membered cyclic alkyl group bonded to each other, and R 4 represents a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms. ] |