http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11218922-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1998-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d867fbc0055e01cbb17c43ff403150e9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b54276cb2c8ee9128e1aa15a19c723b9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a54efae1c115dfe927482f2de97b2f7c |
| publicationDate | 1999-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11218922-A |
| titleOfInvention | Positive photosensitive resin composition and method for producing resist image using the same |
| abstract | (57) [Problem] To provide a positive photosensitive resin composition having high sensitivity and high resolution and a method for producing a resist image. SOLUTION: An alkali aqueous solution-soluble resin, a compound that generates an acid by irradiation with actinic radiation, a substance having an acid-decomposable group that increases the solubility in an alkali aqueous solution by an acid-catalyzed reaction, and two or more in one molecule as a solvent And a compound having two ketone groups. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009084573-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8536347-B2 |
| priorityDate | 1998-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 105.