| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f09378c018e7719f171f7e91f2dd60fd |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate |
1998-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e266f4cb3b8de826114f79c58113b74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd5852efdbfe5a965dd83393e04e95ae |
| publicationDate |
1999-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H11218921-A |
| titleOfInvention |
Positive photosensitive resin composition and method for forming resist pattern |
| abstract |
(57) [Problem] To provide a positive photosensitive resin composition excellent in safety workability, work efficiency, and product quality stability. Kind Code: A1 A liquid or solid positive photosensitive resin composition to be used in an environment of irradiation with safety light having a maximum wavelength within a range of 500 to 620 nm, and a non-photosensitive coating formed from the composition. A positive photosensitive resin composition having an absorbance of 0.5 or less in a range of -30 nm to +30 nm of a maximum wavelength selected from the range of the maximum wavelength of the safety light. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1393131-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1393131-A1 |
| priorityDate |
1997-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |