http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11212272-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 |
| filingDate | 1998-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_291e4d9e2eb0830f5ececd14d3ac8ae1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05048a398adfd35aa8634ba9343c3f03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d784695368287472b9a3125aa2aa1e9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fb90da9118934a9d31f7e9137b7f878 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153fdfb6540c332897c4b5906359634a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d937ac5c11b89974d45afef3bf3df7c |
| publicationDate | 1999-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11212272-A |
| titleOfInvention | Method for producing relief pattern, relief pattern for additive, relief pattern for barrier formation, relief pattern, and photosensitive element used for the production |
| abstract | PROBLEM TO BE SOLVED: To provide a relief pattern excellent in chemical resistance and solvent resistance, suitable for an additive method, a leaf pattern for forming a barrier of a plasma display, and a relief pattern for producing a relief pattern with high yield. A manufacturing method and a photosensitive element are provided. SOLUTION: The ratio (b / a) a relief pattern in which a) is 0.5 to 1.0, the above-mentioned ratio (b / a) cut in a stripe-shaped plane perpendicular to the longitudinal direction Is 0.5 to 1.0, a relief pattern for additive, a relief pattern for barrier formation, and a light transmittance of 0.5 to 1.0. 40% of the photosensitive resin layer was imagewise exposed, and the ratio (b / a) a method for producing a relief pattern wherein a) is 0.5 to 1.0, and a photosensitive film comprising a support film and a photosensitive resin layer having a light transmittance of 0.5 to 40% at a wavelength showing the maximum absorption. Sex element. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006095869-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006310679-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11140768-B2 |
| priorityDate | 1998-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 76.