http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11191367-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-227 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K11-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1997-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c555b4775438c7f68d1989c240e895d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be4093e90b62a9e3dab9156d5aa9208c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4566e477ce3657aab1dde528ff23a26d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d784695368287472b9a3125aa2aa1e9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05048a398adfd35aa8634ba9343c3f03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b89cdc9619d7212792c3e3f99214878 |
| publicationDate | 1999-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11191367-A |
| titleOfInvention | Method for producing phosphor pattern, phosphor pattern and back plate for plasma display panel |
| abstract | PROBLEM TO BE SOLVED: To provide a method of manufacturing a phosphor pattern excellent in workability and environmental safety, a phosphor pattern having a high precision, a uniform shape, and excellent luminance, and a phosphor pattern provided with the phosphor pattern. A back panel for a plasma display is provided. A pressure is applied to (B) a buried layer in a state where (B) a buried layer is disposed on a (A) phosphor-containing photosensitive resin composition layer on a substrate having irregularities. (A) a step of laminating a photosensitive resin composition layer containing a phosphor and a releasable (B) burying layer, (II) a step of imagewise irradiating an actinic ray, (II) I) (A) a step of selectively removing a photosensitive resin composition layer containing a phosphor to form a pattern, and (IV) a step of irradiating the pattern with actinic light and / or a step of heating the pattern. And (V) a method of manufacturing a phosphor pattern including the steps of forming a phosphor pattern by removing unnecessary components from the pattern by firing. |
| priorityDate | 1997-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 291.