| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2e1ea5cf6944cd5f83d76f3ceaae5048 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-085 |
| filingDate |
1997-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b49b0284bc7090ee2510a0b78399ca72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e0cf880cb7a3329c660eed581737082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bab4a3f4bd556b39f6763a22681b1fc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ba19b9ad6a23eaf2c39a5b47df80b77 |
| publicationDate |
1999-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H11184080-A |
| titleOfInvention |
Positive photoresist composition |
| abstract |
(57) [Problem] To provide a positive photoresist composition capable of forming a resist pattern having excellent adhesion to a substrate. SOLUTION: A positive photoresist composition comprising a polymer containing specific amounts of polypropylene oxide groups and polyethylene oxide groups. |
| priorityDate |
1997-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |