| abstract |
(57) [Problem] To provide a detergent composition which is excellent in cleaning properties of a semiconductor substrate or a semiconductor element to which solid fine particles and oily stains are adhered and has less foaming. An object of the present invention is to provide a cleaning method which is excellent in cleaning properties of a semiconductor substrate or a semiconductor element to which it has adhered and which has less foaming. At least one kind selected from the group consisting of acrylic acid, methacrylic acid and maleic acid is used as a monomer component, and the monomer component is used in an amount of 20% of the total amount of the monomer components. Weight-average molecular weight of 500 to 500% A cleaning composition for a semiconductor substrate or a semiconductor element, comprising 150,000 polycarboxylic acid compounds, and a method for cleaning a semiconductor substrate or a semiconductor element using the cleaning composition. |