http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11180060-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13aa7b32ae00ed83af7dfaa0b6a1f7c2
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N1-08
filingDate 1997-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c84c29e2cc3483f5e11974eec5b4074
publicationDate 1999-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H11180060-A
titleOfInvention Lithographic printing plate support, method of manufacturing the same, method of forming pits, and photosensitive lithographic printing plate
abstract (57) [Summary] [Problem] To improve the printing suitability when using blanket stains or water squeezed water and high absorbency, Provided are a lithographic printing plate support capable of maintaining performance against fluctuations in printing conditions, a method of manufacturing the same, a pit forming method applicable to the manufacturing method, and a photosensitive lithographic printing plate having the above-described performance. The average pit diameter or average wavelength is 3 μm to 2 μm. A small pit having an average opening diameter of less than 0.1 to 1.0 μm formed by being densely superimposed on a roughness component of 0 μm; A lithographic printing plate support having a standard deviation of small pit diameter distribution of 0.3 or less. The anodic oxide film formation treatment is performed on the Al-based material in an acidic electrolytic solution, the unevenness of the anodic oxide film / metal interface is created, and the pit is formed based on the unevenness of the interface by performing a chemical surface treatment. Pit formation method to be formed. A method for producing a lithographic printing plate support, wherein pits are formed thereby. A photosensitive lithographic printing plate having a photosensitive layer formed on the above support.
priorityDate 1997-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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