http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11176898-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_22f5d33cfbf4210cc6217665f0bb62d6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9d527f9a5c3e991a1797de3518a88d14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_70259655d3f85d70aa8f580536549087 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-3563 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-359 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956 |
| filingDate | 1997-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5044837df9110c195e64860dc2813499 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d610962ca308e32d349459078e1a560 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75bda2a88b0820d6fb940101ed307bd2 |
| publicationDate | 1999-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11176898-A |
| titleOfInvention | Organic contamination detection / removal device, organic contamination detection / removal method thereof, chemical contamination detection / removal device, and chemical contamination detection / removal method |
| abstract | (57) [Summary] [Problem] To detect organic contamination causing a decrease in yield at the stage of manufacturing a highly integrated semiconductor at a high speed, and simultaneously analyze a substance component of the contamination to remove the contamination. And a method for detecting and removing organic contamination, a device for detecting and removing chemical contamination, and a method for detecting and removing chemical contamination. And A semiconductor silicon wafer 1 pair of pair toward the trench facing formed on as the inspection object, after multiple reflections and inside the semiconductor silicon wafer 1 enters the infrared 2 from the end face of one of the pair towards the trench, and the other optical dry cleaning mechanism and organic contamination detection means for detecting organic contaminants by spectral analysis from the infrared ray pairs emitted from the end face of the counter-bets <br/> wrench, when it is determined that organic contamination is there to remove organic contaminants And means for again checking whether or not organic contamination has been removed by the organic contamination detection means in the same apparatus. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5559163-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4738610-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103824788-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010070274-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02057754-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011053213-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023002854-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6657196-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010223871-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002257765-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0113093-A1 |
| priorityDate | 1997-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.