Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-10 |
filingDate |
1997-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82b42b58d3d6de0c4c107d29d7101067 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5b056c4eb7fbbac6a31a8c5a207594b |
publicationDate |
1999-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H11174205-A |
titleOfInvention |
Synthetic resin lens with anti-reflective coating |
abstract |
(57) Abstract: A primer layer and a dyeable hard coat layer are formed on a synthetic resin base material, and an antireflection film is deposited thereon with good adhesion. Kind Code: A1 An ion cleaning is performed as a pretreatment for vapor deposition, and a silicon oxide having excellent adhesion to a silicon-based hard coat is used as a first layer material to be vapor deposited first. It is possible to sufficiently secure the adhesion of the antireflection film by reducing the internal stress of the deposited film by reducing the thickness of the film. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002243901-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1764398-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6773465-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0188048-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0118773-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015035000-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001172760-A |
priorityDate |
1997-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |