| abstract |
(57) [Summary] [Problem] A line width deviation (Swin) with respect to a change in film thickness. g width), high resolving power, good suitability for halftone phase difference shift mask (side lobe light resistance), which has been incompatible with the past, few development defects, few residual standing waves, and resist performance To provide an excellent positive photoresist composition. SOLUTION: As an alkali-soluble resin, an alkali-soluble low molecular weight compound, and a quinonediazide sulfonate photosensitizer, a diester of quinonediazide of a phenolic low molecular weight compound having a specific structure and a complete ester of quinonediazide of a specific structure are respectively used A positive photoresist composition containing a specific content. |