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filingDate 1997-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1999-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H11160865-A
titleOfInvention Water-soluble photosensitive composition and method for forming black matrix pattern using the same
abstract PROBLEM TO BE SOLVED: To provide a high-sensitivity, excellent adhesion to a glass substrate, easily peelable, no peeling residue, and a service life, particularly as a photoresist used for producing a black matrix such as a color cathode ray tube. The present invention provides a water-soluble photosensitive composition having a long storage stability and excellent storage stability. SOLUTION: A water-soluble photosensitive composition is prepared by mixing a water-soluble polymer composed of two kinds of polyvinyl alcohol and vinylpyrrolidone-vinylimidazole copolymer and a photosensitive bisazide compound. After forming a photo-curing pattern on a substrate with this water-soluble photosensitive composition, a light-absorbing substance is applied over the entire surface and dried, and then the photo-curing pattern and the light-absorbing substance thereon are peeled off to form a black matrix pattern. Formed on a substrate.
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