| abstract |
Kind Code: A1 Abstract: A carboxylic acid-based pattern which is transparent in a far ultraviolet region including a wavelength of 193 nm of an ArF excimer laser, has high dry etching resistance, has good aqueous alkali developing characteristics, and has high resolution and high stability. Provided are a forming material and a pattern forming method using the same. Kind Code: A1 An alkali-soluble resin containing a carboxylic acid in a side chain, a compound generating an acid by irradiation with active actinic radiation, and a compound having a reactivity of decreasing or increasing the solubility in an aqueous alkali solution by an acid-catalyzed reaction, A pattern-forming material containing a compound is used. |