http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11143077-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1997-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2e23a4818e7db7cee33f96279ca2059 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13b22d9eeb786cbc988697b112737eaf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20c55d330817ba085801eb1ff3eb3cde |
| publicationDate | 1999-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11143077-A |
| titleOfInvention | Photosensitive resin composition |
| abstract | PROBLEM TO BE SOLVED: To provide a photoresist which is excellent in resolution, sensitivity, heat resistance, focus margin, exposure margin, adhesion, foaming margin, storage stability and coating properties, and is useful for fine processing. I do. SOLUTION: In a photosensitive resin composition containing an alkali-soluble resin (A), a photosensitive compound (B), and a solvent, as the alkali-soluble resin, a phenolic compound and 1,3,5-trioxane are mixed. A novolak resin composed of a condensate is used. |
| priorityDate | 1997-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 188.