http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11133598-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1997-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_961516b24aac50a4fd1ebe365fcdf2e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ef0cacd9d4c8c83934baf8653b0a6ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c35caa566cc9fa811ad0fde038dbf50e |
publicationDate | 1999-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H11133598-A |
titleOfInvention | Photosensitive composition, photosensitive material, method for producing relief pattern and method for producing polyimide pattern |
abstract | (57) [Summary] (Revision) [Problem] A relief pattern which exhibits excellent photosensitive characteristics and storage stability, and which can provide a photosensitive composition, a photosensitive material, a polyimide pattern, etc. having high resolution and good process stability. And a method for producing a polyimide pattern. SOLUTION: The photosensitive composition comprising anthracene, a titanocene compound represented by the general formula (I) and an addition polymerizable compound having a boiling point of 100 ° C. or more at normal pressure, an anthracene, a compound represented by the general formula (I) A photosensitive material comprising a titanocene compound represented, a polyimide precursor having a carbon-carbon double bond that can be dimerized or polymerized by actinic radiation, and an actinic ray is patterned on a coating film of the photosensitive composition or the photosensitive material. And a method for producing a polyimide pattern obtained by heating the obtained relief pattern. (Wherein, R 1 to R 10 each independently represent a hydrogen atom, a halogen atom, an alkoxy group having 1 to 20 carbon atoms, or a heterocyclic ring) |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003050459-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011095765-A |
priorityDate | 1997-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 185.