http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11131244-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 1997-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87d2143c0ec81fd7bf3714aa78a28386
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93d9ccebf6afe500a0a91036f616c13c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8298680bf7fc3f0063af2f45131c3b5
publicationDate 1999-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H11131244-A
titleOfInvention High frequency electrode for plasma generation, plasma CVD apparatus and plasma CVD method constituted by the electrode
abstract (57) [Problem] To provide a semiconductor device efficiently by stably forming a high-quality deposited film having a very uniform film thickness and a uniform film quality on a large-area substrate at a high speed. It is an object of the present invention to provide a plasma-generating high-frequency electrode that can be used, a plasma CVD apparatus and a plasma CVD method constituted by the electrode. The present invention relates to a rod-shaped or plate-shaped plasma generating high-frequency electrode for generating plasma by high-frequency power, and a grounding portion at a tip end opposite to a feeding point of the plasma generating high-frequency electrode. The absolute value of the reactance is characterized by being not more than a certain value in order to obtain the stability of discharge, characterized in that the electrode constitutes a plasma CVD apparatus and a plasma CVD method. is there.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7047903-B2
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priorityDate 1997-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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