| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b19eaa8e535da4e4bceed99917a68153 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1997-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a9cedd8b03edcfe768816141e7f6dbb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_254466728ea82d9c3b06c1d279577340
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4140f4ff3ac4d3103ac47dd46c73eae |
| publicationDate |
1999-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H11119426-A |
| titleOfInvention |
Positive photosensitive resin composition |
| abstract |
(57) [Problem] To provide a highly sensitive positive photosensitive resin having excellent adhesion and excellent transparency. SOLUTION: A positive photosensitive resin composition comprising a polybenzoxazole precursor (A) represented by the following formula and a reaction product of a component (B) as a photosensitive diazonaphthoquinone compound and a phenol compound as essential components. Embedded image n is an integer from 2 to 100. Embedded image |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007034716-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11048167-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016117347-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007034716-A1 |
| priorityDate |
1997-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |