| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-58 |
| filingDate |
1997-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c5d3656f89ecaca6b56c048b46c5000
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58b9546f05539f96093c4b6bd982bb4f |
| publicationDate |
1999-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H11102072-A |
| titleOfInvention |
Positive resist and photomask manufacturing method using the same |
| abstract |
(57) [Problem] To provide a method for manufacturing a high-resolution photomask at a high throughput by solving the problem that the pattern of a chemically amplified positive resist on a chromium oxide becomes skirted. A resist composition comprising at least (a) a compound which is converted into a substance having an affinity for a developing medium by a reaction using an acid as a catalyst and (b) an acid precursor which generates hydrogen bromide by irradiation with active actinic radiation, The composition is applied on a photomask substrate, irradiated with an active actinic ray such as an electron beam, and then baked. The substrate is developed with an alkaline aqueous solution to obtain a pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011090343-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11586110-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11720020-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006287236-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014006403-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11604411-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11493843-B2 |
| priorityDate |
1997-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |