| abstract |
(57) [Problem] To provide a positive photosensitive resin composition developable with an alkaline developer. A positive photosensitive resin composition comprising (a) a polymer having a structural unit represented by the general formula (1) as a main component and (b) a naphthoquinonediazide compound. Embedded image (R1 is a tetravalent aromatic group, R2 is a trivalent aromatic group, R3 is a divalent aromatic group, R4 is hydrogen or an organic group having 1 to 20 carbon atoms. N is 10 to 100, Integer up to 000.) |