http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1097998-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46 |
| filingDate | 1996-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a0f121b01608c27a44f2f54c2b32c2d |
| publicationDate | 1998-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1097998-A |
| titleOfInvention | Deposition film formation method |
| abstract | PROBLEM TO BE SOLVED: To reduce the size of a base without increasing unevenness of characteristics of a deposited film and structural defects of the deposited film, and in particular, to reduce the diameter of a light receiving member for electrophotography and to be excellent in productivity. And a method for forming a deposited film. A substrate (10) is placed in a reaction vessel (101) that can be depressurized. 2 is disposed, the substrate is heated, and a raw material gas and discharge power are introduced into the reaction vessel to form a deposited film on the substrate. First, the first heating means 103 is previously set in the reaction vessel, then the base is set for the first heating means, and finally, the second heating means 104 is set for the base. After that, the substrate is heated by the first and second heating means. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008091532-A |
| priorityDate | 1996-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.