| abstract |
PROBLEM TO BE SOLVED: To provide a photopatternable polymer composition excellent in thermal stability, low thermal expansion coefficient, chemical stability, water resistance, solvent resistance, low dielectric constant, mechanical properties and adhesive properties, and A method for producing the polymer is provided. SOLUTION: The weight average molecular weight is about 1,000 to about 10 000, wherein the polymer comprises at least some monomer repeat units having a first photosensitive donating substituent that allows the polymer to crosslink or chain extend when exposed to actinic radiation. Including, about 140 ° A second heat-sensitive donating substituent that allows further crosslinking or chain extension of the polymer when exposed to temperatures above C, wherein the first substituent is not the same as the second substituent and the polymer is A polymer composition having a characteristic structure is provided. |