| abstract |
PROBLEM TO BE SOLVED: To provide a high-sensitivity, high-resolution, thinning of a resist pattern with the passage of time from exposure to heat treatment, or to have a T-type (T-top) resist surface. Provided is a positive photosensitive composition which does not exhibit and further has less profile deterioration such as remaining standing waves and pattern collapse. SOLUTION: A resin having a group which is decomposed by the action of an acid to increase solubility in an alkali developer, and two kinds of compounds having a specific structure as a compound which generates sulfonic acid upon irradiation with actinic rays or radiation. A positive photosensitive composition containing a compound, for example, a compound of the following structural formula. 1) This alkyl group having 12 carbon atoms is a residue having various branched structures. |