http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1090900-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D11-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1996-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23cfb055bf88286becaa503a8173bab7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95abef66d2421784b64504a6307d2acd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f6553ef1a478063d4e87a61e8f33899 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f725de632c885a7aa9822ba15f83dd3 |
| publicationDate | 1998-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1090900-A |
| titleOfInvention | Method of partitioning and separating photoresist material and photoresist composition |
| abstract | (57) [Abstract] (Modified) [Problem] To achieve a good balance of scum reduction, high resolution, high depth of focus, high sensitivity, and high heat resistance in the photoresist field, especially in the positive photoresist field. And a method for partitioning and separating a photoresist material to obtain such a photoresist composition. SOLUTION: A photosensitive resin obtained by esterifying an alkali-soluble resin with a quinonediazide compound, a resin-photosensitive agent mixture obtained by mixing an alkali-soluble resin with a quinonediazide compound, and a resin-photosensitive agent mixture obtained by mixing the photosensitive resin with a resin-photosensitive agent mixture After stirring the photoresist material selected from the mixture in a mixed solvent of a good solvent and a poor solvent, dissolving and distributing the high molecular weight components in the photoresist material into the poor solvent, separating the poor solvent. The photoresist material is repeatedly separated into a plurality of components having different weight average molecular weights. |
| priorityDate | 1996-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 80.