http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1083086-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 1996-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3862652e53ee4758b2ee6b0aab3ca82a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c9dd112b2729526955413f3a348eda6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b5c191c98edf2792186844ca237b38e |
| publicationDate | 1998-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1083086-A |
| titleOfInvention | Developing solution for actinic radiation sensitive polymer composition and pattern forming method |
| abstract | (57) Abstract: In developing an actinic ray-sensitive polymer composition film, not only can pattern processing be performed safely and easily, but also a relief pattern having a high development yield can be obtained. A film is formed using an actinic radiation-sensitive polymer composition containing a polymer containing a polyimide precursor as a main component, and the film is irradiated with actinic radiation in a desired pattern and then developed. In the developer, the pH of the developer is 6-1. 1.7. A developer for an actinic radiation-sensitive polymer composition, which is 1.7. |
| priorityDate | 1996-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 105.