http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1083078-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1996-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58b9546f05539f96093c4b6bd982bb4f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c5d3656f89ecaca6b56c048b46c5000 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46a0f1c26405ca27ff0ad563928670b9 |
| publicationDate | 1998-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1083078-A |
| titleOfInvention | Resist composition and pattern forming method using the same |
| abstract | (57) [Problem] To provide a positive resist composition having high sensitivity to various radiations and excellent in resolution, heat resistance, developability and pattern shape. The resist composition includes a polymer resin matrix and a compound that is modified into a substance having an affinity for a development medium by a reaction induced by exposure to light, and the dissolution rate of only the polymer resin matrix in a predetermined development medium is high. A resist composition wherein the dissolution rate of a composition containing 10 parts by weight of a compound after being modified into a substance having an affinity for a developing medium with respect to 100 parts by weight of a resin matrix in a predetermined developing medium is 1/5 or less. |
| priorityDate | 1996-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.