http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1081598-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5c121269689cbab9b3a4548b15caf3
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B31-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-00
filingDate 1996-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7e03fa03b254a35f1b43f4d2f491789
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1345b3ed22e1f7b8d91e7d62b07bf455
publicationDate 1998-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1081598-A
titleOfInvention Method for producing 6H-SiC by laser ablation
abstract (57) [Problem] To be used as an optical device element material such as a semiconductor laser, it is necessary that different polytypes do not coexist. In addition, all of the conventional manufacturing methods require a long time to grow a crystal. An instantaneous synthesis method has long been desired. SOLUTION: The present invention instantaneously generates a high temperature and a high pressure by condensing a strong pulsed laser beam on an interface between a silicon substrate and an organic solvent, and instantaneously generates 6H-SiC by irradiation of a single pulsed laser beam. A method for producing 6H-SiC by laser ablation, which comprises synthesizing a nanocrystal aggregate in a short crystal growth time.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100384892-B1
priorityDate 1996-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 20.