http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1078659-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1996-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464180103f87187b3aab20511a8537b7 |
| publicationDate | 1998-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1078659-A |
| titleOfInvention | Photosensitive composition |
| abstract | PROBLEM TO BE SOLVED: To have good sensitivity, high resolution, and no problems such as formation of T-top due to lapse of time from exposure to post-exposure bake (PEB) and reduction in sensitivity and resolution. Provided is an excellent photosensitive composition that forms a stable resist pattern. SOLUTION: The photosensitive composition contains a compound having at least one kind of group having a specific structure that can be decomposed by the action of an acid and having an increased solubility in an aqueous alkaline solution by the action of an acid. |
| priorityDate | 1996-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 317.