| abstract |
(57) [Problem] To provide a method for manufacturing an element having a uniform polished surface using a slurry having improved characteristics. SOLUTION: The method for manufacturing a semiconductor device includes a substrate (19). Step (51), step (52) of preparing a colloid (17) in which particles are held in suspension, reagent (1) 8) preparing (53), placing the substrate (53) on the processing tool (10) (54), colloid (17) And combining the reagent (18) to form a slurry (28) (55), decomposing the reagent (18) into a surfactant and an oxidizing agent (56), and treating using the slurry (28). Processing the substrate (19) in the tool (10) (57), and processing the substrate (19) in the processing tool (10) (58). |