http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1074450-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-14 |
| filingDate | 1996-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd8bf44a61ac0101557d37defd4064dc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de817f7992eff331c44b61169251de9c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2a041af27327763b762729da043f91 |
| publicationDate | 1998-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1074450-A |
| titleOfInvention | Manufacturing method of shadow mask |
| abstract | (57) [Problem] To provide a method of manufacturing a shadow mask capable of suppressing variation in aperture size and shape and obtaining a high quality shadow mask having excellent uneven quality. SOLUTION: A resist having a pattern corresponding to an opening of a shadow mask is formed on both surfaces of a metal thin plate, and the metal thin plate on which the resist is formed is etched using a ferric chloride solution to form the opening. In the method of manufacturing a shadow mask to be formed, a ferric chloride solution adhering to a metal sheet after etching is replaced with an etching inhibitor liquid that is inert to the metal sheet. |
| priorityDate | 1996-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.