http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1069101-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-05
filingDate 1996-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2987e4653c93f32c4a7293b236927cac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_108e6b7390192a213c46cc746035b75b
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publicationDate 1998-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1069101-A
titleOfInvention Manufacturing method of electrophotographic photoreceptor
abstract (57) [Problem] To prevent liquid dripping and foaming generated from the lower part of a conductive substrate during dipping of a coating solution in the production of an electrophotographic photoreceptor by a dip coating method, and to provide uniform characteristics without coating film defects. To provide a simple method for producing an electrophotographic photosensitive member having the same. SOLUTION: In a method for manufacturing an electrophotographic photoreceptor in which a photoconductive material is coated on a conductive substrate, after cooling the conductive substrate, it is immersed in a coating bath of the photoconductive material to form a coating film. It is characterized by including the step of forming. As the cooling temperature conditions, the temperature of the conductive substrate and the temperature at the time of applying the photoconductive material are [3 × logP−7.5] C ° <temperature of conductive substrate (before coating) −photoconductive material coating solution temperature <−1 ° C. and [3 × log P−7. 5] C ° <Temperature of conductive substrate (after coating) −Temperature of coating solution for photoconductive material <−1 C ° [where P represents the vapor pressure (mmHg) of the solvent of the coating solution. ] Is preferable.
priorityDate 1996-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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