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filingDate 1997-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1998-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1056031-A
titleOfInvention Integrated circuit and manufacturing method thereof
abstract An integrated circuit having a plated copper interconnect surface layer encapsulated in a plastic package. A first and second metallization layer (27, 31) is formed over a substrate (23) to contact a selected one of the devices and to contact each other through vias. The overlying thick surface level metal layer of copper 35 substantially reduces the resistance of the interconnect metallization of the device. Copper surface level interconnect layer 35 is coated with a thin barrier layer 37 of a material that can accept bond wires 41. Plastic package 22 in physical contact with copper interconnect metal The need for a passivation layer has been eliminated by using.
priorityDate 1996-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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