| abstract |
PROBLEM TO BE SOLVED: To provide a negative photoresist composition based on a polyimide primer. The photoresist comprises the following a) a repeating structural unit of the formula (I) (Where A 1 is an oxygen atom or an NH group, R 1 is a residue of a photopolymerizable olefin double bond, [X] is a residue of a cyclic dianhydride of tetracarboxylic acid, and Y is a residue of a diamine. Represents a group) B) a photoinitiator for polymerizing olefinic double bonds c) c1) an organosilicon compound having one or more hydroxyl groups, c2) a formula (IIa) C3) a compound of the formula (IIb) And at least one other component selected from the group consisting of a mixture of two or more components selected from components of the type c4) c1), c2) and c3). |