http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1048827-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3f548ca15b9b5748f1afd80e3d1636ec |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1996-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d51a188e09c7dbd97b036fec179cb9b3 |
| publicationDate | 1998-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1048827-A |
| titleOfInvention | Photosensitive resin composition and pattern forming method |
| abstract | (57) [Problem] To provide a high-resolution positive photosensitive polymer composition which can be developed with an aqueous alkali solution, and a pattern forming method using the composition. (A) a polyamic acid resin in which at least 50 mol% of all acid components are diphenyl ether carboxylic acid compounds, and at least 50 mol% of all diamine components are aromatic ether diamine compounds; (N, A photosensitive resin composition comprising, as essential components, an amine compound such as (N-dimethylamino) ethyl methacrylate and a photoreactive initiator such as (C) 2,6-bis (paraazidobenzal) -4-methylcyclohexanone. This is a pattern forming method in which the composition is coated on a substrate, dried, irradiated with actinic rays, heated for exposure, and then developed with an aprotic polar solvent. |
| priorityDate | 1996-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 181.