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filingDate 1996-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f2b75c99fda4e28000da74a45b571a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e2e2464730ce4f9b89575777e73084f
publicationDate 1998-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1048822-A
titleOfInvention Photosensitive resin composition and photosensitive element using the same
abstract (57) [Summary] (with correction) [PROBLEMS] A photosensitive resin composition which reduces sludge and foaming generated during development, has excellent plating resistance, excellent adhesion to a base metal, and has good tent reliability. And a photosensitive element. SOLUTION: The above (C) comprises (A) a binder polymer having a carboxyl group, (B) a photopolymerizable initiator, and (C) a photopolymerizable compound having a polymerizable ethylenically unsaturated group in a molecule. General formula (I) in the component [Wherein, R 1 represents a trivalent organic group, and R 2 represents a compound of the general formula (II) (Wherein, R 3 represents a hydrogen atom or a methyl group, X represents an alkylene oxide group, and n represents an integer of 1 to 14); and a urethane unsaturated compound represented by the general formula (III) ) [Wherein, Y represents an alkylene oxide group, and k represents 1 to Is an integer of 10) and a photosensitive resin composition containing a compound represented by the formula as an essential component, and coating the photosensitive resin composition on a support, Dry photosensitive element.
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